منابع مشابه
Pad conditioning in chemical mechanical polishing: a conditioning density distribution model to predict pad surface shape
Abstract: Diamond disc pad conditioning is traditionally employed to restore pad planarity and surface roughness in chemical mechanical polishing (or planarisation) (CMP). In this paper, a conditioning density distribution model is developed to predict the pad surface shape resulted from the diamond disc conditioning in CMP. A kinematic study is carried out to calculate and simulate the diamond...
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Popular media describe adverse effects of helicopter parents who provide intense support to grown children, but few studies have examined implications of such intense support. Grown children (N = 592, M age = 23.82 years, 53% female, 35% members of racial/ethnic minority groups) and their parents (n = 399, M age = 50.67 years, 52% female; 34% members of racial/ethnic minority groups) reported o...
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The Brezinski’s idea of using Pad e-type approximants to estimate errors of Pad e approximants is considerably developed. A new, more e ective method based on this idea is presented and illustrated by numerical examples. c © 1998 Elsevier Science B.V. All rights reserved. AMS classi cation: 41A21
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A new idea of polishing pad called flexible nanobrush pad (FNP) has been proposed for the low down pressure chemical mechanical planarization (CMP) process of Cu/ultra-low-к materials. The FNP was designed with a surface layer of flexible brush-like nanofibers which can 'actively' carry nanoscale abrasives in slurry independent of the down pressure. Better planarization performances including h...
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In a recent paper Cabay et al. 1996a], the authors develop a fast, iterative, look-ahead algorithm for numerically computingPad e-Hermite systems and simultaneous Pad e systems along a diagonal of the associatedPad e tables. Included there is a detailed error analysis showing that the algorithm is weakly stable. In this paper, we describe a Fortran implementation, VECTOR PADE, of this algorithm...
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ژورنال
عنوان ژورنال: Nature Chemical Biology
سال: 2014
ISSN: 1552-4450,1552-4469
DOI: 10.1038/nchembio.1448